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Contents:
Film
Properties
Refractive Index
Material Behavior
Evaporation Parameters
Physical Properties of Solid Material
Applications
Forms and Sizes Available |
YTTRIUM OXIDE, Y2O3
FOR OPTICAL COATING
Introduction
Yttrium oxide, Y2O3, is a medium-index,
low-absorption material usable for coatings in the near-UV (300
nm) to IR (12 µm) regions. Hard, dense layers are deposited
by electron-beam evaporation or sputtering. Typical applications
are protection of aluminum and silver mirror coatings, intermediate
layer in wide band visible AR coatings and for XeCl (308 nm)
laser AR and dielectric mirror designs. Yttria can be used in
combination with silicon dioxide layers to form a high index-contrast
structure and also with higher index materials such as titania
(TiO2) and tantala (Ta2O5).
Film
Properties
Yttria films are absorption-free over the range 300 nm to at
least 11 µm. Under some evaporation conditions, such as
low energy resistance-heated evaporation or excessive background
pressure, the films grow with sufficient void volume (packing
density <0.9) to exhibit index changes when vented to moist
air. This manifests itself as absorption bands in the 2.9 µm
(O-H stretching) and 6.9 µm (O-H-O vibration) [1]. When
deposition is done by sputtering, ion assist, or at very high
substrate temperatures, the absorption bands are nearly absent.
The refractive index also responds to high energy deposition
techniques but responds less than other oxides to substrate temperature.
The index remains constant to within 1% over substrate temperature
range 50° C to nearly 300° C [2]. Post-deposition baking
in air can raise the refractive index of electron-beam and resistance-heated
depositions.
Adhesion is excellent to glass, germanium, silicon, zinc sulfide
and zinc selenide, as well as to metals such as aluminum and
silver. In some cases, a very thin layer of yttria can serve
as an adherence promoter for multilayer coatings on non-oxide
substrates.
Some amount of index inhomogeneity can appear with increasing
layer thickness. The effect can be reduced by providing sufficient
oxygen backfill during evaporation. The films generally grow
with an amorphous microstructure, but as mentioned above, there
can be void volume which will absorb water vapor upon venting
the vacuum chamber.
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Refractive
Index
The refractive indices are process dependent. Reactive thermal
and e-beam depositions produce values 1.80 to 1.88 at 500 nm
wavelength, while IAD and magnetron sputtering produce values
>1.90. Above 2 µm wavelength, magnetron values [3] are
close to bulk crystal index values: 1.87 @ 2 µm and 1.72
@ 9 µm, while thermally evaporated values are 1.7 and 1.42
respectively. Approximate values are plotted below.
REFRACTIVE INDEX FOR
YTTRIUM OXIDE
(note scale discontinuity)
Wavelength (nm)
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Material
Behavior
The starting material form is either tablets or sintered pieces.
Gentle preconditioning at reduced power for several minutes is
recommended. The electron-beam should be swept over the surface.
The material sublimes.
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Evaporation
Parameters
|
Evaporation Temperature |
~ 2400° C. |
|
Source Container |
Thick tungsten boat for resistance-heated
evaporation. Tungsten will react and must be replaced after one
evaporation; graphite liner for E-beam. |
|
Rate |
1-2 Å/sec. |
|
Partial Pressure of Oxygen |
5-8 x 10-5 Torr |
|
Substrate Temperature |
50° C to 300° C. |
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Physical
Properties of Solid Material
|
Molecular Weight |
225.81 |
|
Melting Point |
2410° C |
|
Color |
White |
|
Crystal Density |
5.01 g/cc |
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Applications
Because the index below wavelengths 300 nm is near 1.9, yttria
can be used in multilayers with silicon dioxide (n = 1.48) for
UV laser applications. In the visible region, it satisfies the
intermediate index value required for three-layer wide band AR
coatings on glass. Environmental protection of silver and aluminum
mirrors has been demonstrated from the near-UV through the far-IR.
Yttria exhibits no reststrahlen bands below 18 µm, and
therefore does not produce reflection loss at large incidence
angles seen with silicon oxides and alumina.
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Forms
and Sizes Available
|
Item No. |
Purity |
Description |
|
Y-1043 |
99.9% |
8-9 mm dia. x 4-5 mm thick
sintered tablets |
|
Y-1046 |
99.9% |
3-12 mm sintered pieces |
CERAC offers other particle sizes for evaporation as well as
sputtering targets. To view pricing on the items listed above,
please visit our
on-line catalog
and look-up by item number or chemical name. If you require a
custom manufactured item, please contact our sales department
at 414-289-9800 or ceracsales@beminc.com
with your specific requirements. You can also fill out our
quotation request form.
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References
- D. F. Bezuidenhout and R. Pretorius, Thin Solid Films
139, 121 (1986).
- George Atanassov, Roland Thielsch, and Dimitar Popov, Thin
Solid Films 223, 288 (1993).
- E. Masetti, S. Scaglione, L. Caneve, and G. Emialiani, SPIE
Vol. 1019 Thin Film Technol. III (1988).
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