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MAGNESIUM FLUORIDE, MgF2
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| Container | Graphite, Ta, Mo or Al2O3 |
| Evaporation temperature | ~950°C |
| Substrate temperature | 150-250°C |
| Evaporation pressure | 10-5 to 10-6 Torr |
CERAC vacuum melted MgF2 granules can be evaporated by electron beam or resistance heating. Graphite or tantalum containers are suggested. They are loaded to the top with material. For thermal evaporation, a large heater shaped like an open boat is used. The power should be increased slowly, and in the case of E-beam sources, the beam should be swept for even heating. Preconditioning for granules of MgF2 consists of fully melting the charge. The shutter should remain closed until the melt is uniformly red hot. No outgassing is experienced during the preconditioning cycle or during evaporation with CERAC MgF2 coating material.
The pressure should be in the low 10-6 Torr range. When completely melted, the material can be evaporated at a smooth rate of 20Å/sec. without spitting. The temperature of the substrate should be at least 250°C for high film hardness and density on glass or zinc sulfide substrates. In difficult cases, a thin, initial bonding layer of yttrium oxide, Y2O3, can promote nucleation and adhesion. Films will grow and adhere to glass substrates heated to as low as 150°C. Glow discharge cleaning is recommended for low temperature depositions. The melt can be reused until reaction with the holder begins.
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Transparent region (for layers <1 µm thick) |
1200Å (UV) to ~8 µm (IR) |
| Absorption | Begins slowly >8 µm and exceeds 2% near 10 µm for 700 nm thick layers |
| Adhesion to substrates | Good to glass, sapphire, zinc sulfide |
| Refractive index |
1.390 at 300 nm 1.380 at 400 nm 1.375 at 450 nm 1.370 at 500 nm 1.365 at 600 nm 1.360 at 700 nm 1.350 at 1000 nm 1.340 at 1500 nm |
The factor that limits MgF2 layer thickness to ~1 µm is internal stress. MgF2 can be doped with BaF2 to reduce this stress and permit thicker layers to be grown. Please contact the CERAC sales department if this is of interest.
Films of MgF2 that have been deposited on high temperature substrates (250-300°C) using E-beam deposition are mechanically hard but grow with densities only ~80% of bulk density. Voids in the microstructure admit water upon exposure to air, increasing the mean refractive index of the film. Absorption bands are seen in the UV spectra at 3 and 6 µm. Multilayers that include MgF2 will shift in wavelength upon venting the deposition system to room air. Films that are bombarded by high energy ions during growth achieve higher densities, since an amorphous structure is created. This produces an environmentally stable film with a higher refractive index. Excessively high ion energies can, however, deplete the fluorine content and produce absorption in the UV.
| Item No. | Purity | Description |
| M-2010 |
99.999% (Ca<10 ppm) |
1-4 mm pieces, vacuum melted |
| M-1113 |
99.9% (Ca<1%) |
3-6 mm pieces, vacuum melted |
| M-1128 |
99.9% (Ca<1%) |
0.8-3 mm pieces, vacuum melted |
CERAC offers other particle sizes for evaporation as well as sputtering targets. To view pricing on the items listed above, please visit our on-line catalog and look-up by item number or chemical name. If you require a custom manufactured item, please contact our sales department at 414-289-9800 or ceracsales@beminc.com with your specific requirements. You can also fill out our quotation request form.
NOTE: Facts pertaining to properties and processing parameters of MgF2 were derived from published literature sources. Although this information is believed to be correct, CERAC does not guarantee its accuracy.
Phone: 414-289-9800 / FAX: 414-289-9805 / ceracinfo@beminc.com