Technical Publications
ONLINE CATALOG
MSDS SEARCH
PROFILE
PRODUCTS
CUSTOM MANUFACTURING
TECHNICAL PUBLICATIONS
REQUEST INFORMATION
WHAT'S NEW
INTERNATIONAL SALES
SITE SEARCH

Contents

Advantages of Pre-Melted Materials


Volume 14 Issue 2
June, 2004

Material Preparation:  Pre-Melted Forms

Since its inception in January 1991, CERAC Coating Material News (CMN) has provided readers with suggestions for improving thin film deposition quality. Discussions have included reports on the development and preparation of evaporation and sputtering materials for optical, electrical, and mechanical applications. Deposition technology has evolved at a rapid pace, and as a result, very complicated thin film structures have transitioned from being considered impossibly difficult to nearly commonplace. The precision stable narrow-band filters used in DWDM communications are perhaps the ultimate demonstration of the maturity of the science of thin film deposition. To achieve the extraordinary process control required in the manufacture of DWDM filters and other sophisticated coatings requires that the properties of the deposited thin film layers be highly reproducible. This is but one example where the success and economy of a production process depend on reproducible and stable coating material properties.

Coating designs are based on the refractive index difference between the high-n and low-n materials. The choices for n~2+ are greater than those for the low-n material, which is generally silica (n =1.45). Therefore the choice of the high-index component can be influenced by other properties of the deposited film such as transparency range, mechanical hardness, abrasion resistance and stress, and laser damage resistance. CERAC has developed process-ready high-index refractory metal oxide compounds in the form of pre-melted materials.

 

Advantages of Pre-Melted Starting Materials

The reproducibility and stability of the optical and mechanical properties of thin film material layers are strongly dependent on the preparation of the starting evaporation material. Refractory metal oxide compounds require temperatures ranging from 1000° to 2500° C to transition from the solid to vapor state. An electron beam concentrated to a small local area of shallow volume is used to achieve these temperatures and to vaporize the compound. Those compounds that require high melting temperatures exhibit the characteristic of very localized melting, and when the e-beam is not continuously swept it will melt a hole into the pieces rather than distribute heat to melt a large volume. Evaporation from the recessed area created narrows the deposition pattern at the substrate location. Thickness uniformity and inconsistent rate monitoring are undesirable complications associated with non-uniform spatial distribution.

Table 1

Material Evap Temp (deg.C) n at l 350 nm n at l 550 nm n at l 1550 nm Notes & Applications: Spectral range, laser damage threshold 
Al2O3 2100 1.65 1.62 1.58 <220 nm to ~10 mm.  High UV Ldt. Dense films require ion assist.
HfO2 2500 2.06 2.0 1.98 Hard films.  230 nm to ~10 mm.  High UV Ldt. Inhomog. tendency
Ta2O5 2000 2.35 2.12 2.06 Low absorption 300 to > 7mm.; water-band free.
TiO2 1500 -- 2.3 2.2 Highest index.  Abs. <500 nm.  450 10-11 mm.
ZrO2 2200 2.1 2.0 1.95 Hard, wear-resistant.  high UV LDT. >l 250 nm. Inhomog. tendency.

(notes: LDT = Laser Damage Threshold.  Indices can be increased through energetic ion processes.)

 

Table I lists materials of high utility for optical thin films and their properties and applications. All of the oxides in the table can be paired with the low-index material SiO2 to form durable, transparent multi-layer coatings. Most of them require a partial pressure of oxygen during evaporation to insure complete oxidation and absorption-free transparency. The properties of the deposited layers depend on substrate temperature (or ion energy), rate, and partial pressure of oxygen. We have discussed specific deposition parameters in past CMN issues, and they are summarized in Table II.

 

Table II

Material Substrate Temp (deg.C) O2 Partial Pressure (10-5 Torr) Evap Rate (A/s) Notes
Al2O3 >200 1-5 ~5 Sweep beam slowly, densify layer with high energy process such as IAD.  No Liner.
HfO2 150-300 1-10 2-4 Slow sweep.  No liner.
Ta2O5 200-350 6-10 2-5 Good Vis to >1500 nm.  Graphite liner.
TiO2 ~50-200 5-10 ~2-5 Requires high O2 to prevent reduction and absorption.  Water absorp. ~900 nm.
ZrO2 >200 2-8 2-5 Sublimes.  Discourage inhomogeneity with IAD.

 

The parameters of Table II assume e-beam evaporation without high-energy ion bombardment. The behavior and properties can be changed with IAD. For example with IAD, the substrate temperature can be lowered significantly while maintaining or improving on the density, hardness, refractive index, and often the adhesion properties of the layer. The higher temperature materials tend to develop multiple crystal states that transition form with temperature. These crystal forms possess different refractive indices, stress levels, and evaporation temperatures, complicating the process by introducing uncontrolled variable rates and complicating the results. Constraining to one crystal morphology is possible by melting at a controlled, consistent temperature. The latter is not possible in a small focused e-beam configuration where temperatures can differ by several hundred degrees between areas separated by a few mm, and where melting and recrystallizing zones are mixed.

When the starting material, generally a dielectric, is granular in form, heat transfer is inefficient and rapid heating of dust or points often causes explosive emanation of material. Particulate spatter ranging from occasional blasts to showers is often observed, and included particulates or the voids caused when they abrade away are unacceptable coating defects that reduce production yield. The presence of particulates in or on the coating results in failures that might cause optical scatter, might initiate mechanical stress fracturing, admit moisture, or might initiate laser damage. Explosive emanation of particulates or trapped volatiles often causes pressure and rate surges that can contribute to the inhomogeneity of the optical properties of the growing layer even disrupt the deposition process by upsetting the thickness monitoring system.

The problem is not restricted to broken pieces of the compound crystals, but also occurs with materials prepared by pressing into tablets, with or without a binding material. Evaporation technicians have developed techniques for reducing spatter and pressure/ rate effects that consists of melting the broken pieces or tablets to preparing a denser form of metal oxides starting materials for deposition. The process of forming a dense plug suitable for smooth evaporation consists of filling the crucible, melting down under vacuum, venting, recharging, and melting down again is a non-productive use of chamber time and resources.

Another problem reported with these dielectrics is the deflection or defocus of the electron beam due to charging of the material. This problem is eliminated when the material is slightly conducting, as partially reduced oxides are.

The solution to obtaining particulate-free E-beam consistent and economical depositions is to pre-melt the difficult materials without tying up any production resources. CERAC now has available pre-processed / pre-melted forms of the materials listed in the Tables above. Using a high power e-beam furnace, the bulk material in crystalline starting form is completely melted under controlled oxidation conditions. The resulting refractory oxide materials are prepared in the forms of pre-molded cones for standard crucible liners, rods, plates, or broken pieces ready for evaporation. The metal oxide compounds can be prepared with completely oxidized composition or partially reduced. The choice is dependent on the process and might consider the composition or deposition parameters of the adjacent layers of the stack. For example, alumina and silica (SiO2) layers require little or no oxygen backfill pressure, while titania layers require a high O2 partial pressure be present during layer deposition to eliminate absorption.

Another advantage of using pre-processed materials is that they provide consistent results run after run. Materials with multiple oxidation states, such as the titanium oxide series, can change composition after the first few evaporations from the crucible. Obviously this variability would make it impossible to achieve a repeatable production process. In critical applications, for example AR coating designs for eyeglasses that use thin layers of TiO2, it is important that the index of the layers remain at their design-prescribed value. Small deviations cause the average R to exceed the tolerable value and render the coating lot unusable.

Complex, multi-layer optical coating designs may require dozens of layers, some relatively thin. The evaporation of conventional materials requires time and some degree of conditioning of each material before the shutter can be opened to deposit each material in the sequence of alternating material layers. Modern evaporation systems operating under automated control use materials that require a minimum ramp-up to achieve a rapid and consistent state of readiness as the recipe calls out switching materials in the programmed sequence of layers. With the exception of hafnia and zirconia the oxide compounds listed evaporate from a melted surface created by the e-beam. Evaporation proceeds from the heated hafnia and zirconia surfaces primarily by sublimation because the melted surface layer is very thin. Pre-melted materials offer a more constant composition and surface topography compared with the irregular surface of a pile of randomly sized pieces, therefore evaporation proceeds more smoothly, especially for the non-melting materials.

 

 

 

 

(S.F. Pellicori is available for private consulting on matters concerning optical thin films. Please contact him directly for more information)

Editor:
David Sanchez
Sr. Materials & Applications Scientist
CERAC, inc.
P.O. Box 1178 | Milwaukee, WI 53201
Phone: 414-289-9800 | FAX: 414-289-9805
e-mail: marketing@cerac.com

Principal Contributor:
Samuel Pellicori
Pellicori Optical Consulting
P.O. Box 60723 | Santa Barbara, CA 93160
Phone/FAX: 805-682-1922
e-mail: pellopt@silcom.com

back to top  
All printed, graphic and pictorial materials made available on this website are owned by CERAC and protected by Federal Copyright laws. None of the materials, in whole or in part, may be reprinted and distributed or otherwise made available to others for any purpose without CERAC's prior written consent.

Phone:  414-289-9800 /  FAX: 414-289-9805  /   info@cerac.com